化合物简介
Gallium(II) telluride, GaTe, is a chemical compound of gallium and tellurium. There is research interest in the structure and electronic properties of GaTe because of the possibility that it, or related compounds, may have applications in the electronics industry. Gallium telluride can be made by reacting the elements or by metal organic vapour deposition (MOCVD). . GaTe produced from the elements has a monoclinic crystal structure. Each gallium atom is tetrahedrally coordinated by 3 tellurium and one gallium atom. The gallium-gallium bond length in the Ga2 unit is 2.43 Angstrom. The structure consists of layers and can be formulated as Ga24+ 2Te2−. The bonding within the layers is ionic-covalent and between the layers is predominantly van der Waals. GaTe is classified as a layered semiconductor (like GaSe and InSe which have similar structures). It is a direct band gap semiconductor with an energy of 1.65eV at room temperature. A hexagonal form can be produced by low pressure metal organic vapour deposition (MOCVD) from alkyl gallium telluride cubanes e.g. from (t-butylGa( μ3-Te))4. These cubanes are so-called because they have a structure related to C8H8, cubane. The core consists of a cube of eight atoms, four gallium, and four tellurium atoms. Each gallium has an attached t-butyl group and three adjacent tellurium atoms and each tellurium has three adjacent gallium atoms. The hexagonal form, which is closely related to the monoclinic form, containing Ga24+ units, converts to the monoclinic form when annealed at 500 °C.
基本信息
中文名称
碲化镓(II)
英文名称
GALLIUM TELLURIDE
中文别名
碲化镓
英文别名
CAS号
12024-14-5
分子式
GaHTe
分子量
198.331
精确质量
199.84
PSA
0.0
LOGP
-0.4241
编号系统
EINECS号
234-690-1
MDL号
MFCD00135536
安全信息
安全说明
S22; S24/25
危险类别码
R22; R36/37/38
危险品标志
Xn
生产方法及用途
生产方法
加热熔化按化学计量碲和镓的混合物可制得GaTe。